发明名称 Radiation-emitting semiconductor component with a vertical emission direction and fabrication method for producing the semiconductor component
摘要 A radiation-emitting semiconductor component with a vertical emission direction, has a substrate, a first reflector layer, and a semiconductor layer sequence based on InGaN disposed on the first reflection layer. The semiconductor layer sequence contains a radiation-generating active layer. A second reflector layer is disposed on the semiconductor layer sequence and forms, together with the first reflector, a resonator disposed vertically with respect to the main direction of extent of the semiconductor layer sequence and whose axis represents the vertical emission direction of the semiconductor component. The second reflector layer is at least partly transmissive for radiation generated by the active layer and the radiation is coupled out through the second reflector layer. The substrate contains an electrically conductive material. The first reflector layer is a doped, epitaxially grown, distributed Bragg reflector layer, so that a simple electrical contact connection of the semiconductor component is possible without complex construction.
申请公布号 US2003160257(A1) 申请公布日期 2003.08.28
申请号 US20030375764 申请日期 2003.02.26
申请人 BADER STEFAN;LUGAUER HANS-JURGEN;BRUDERL GEORG;HARLE VOLKER 发明人 BADER STEFAN;LUGAUER HANS-JURGEN;BRUDERL GEORG;HARLE VOLKER
分类号 H01L33/10;H01S5/183;H01S5/323;(IPC1-7):H01L33/00 主分类号 H01L33/10
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