发明名称 |
Method of making GaN single crystal and apparatus for making GaN single crystal |
摘要 |
An apparatus comprises a Ga-disposing section in which Ga is disposed; a seed-crystal-disposing section in which a seed crystal of GaN is disposed; a synthesis vessel adapted to accommodate the Ga-disposing section, the seed-crystal-disposing section, and a gas containing nitrogen; heating means adapted to heat the Ga-disposing section and the seed-crystal-disposing section; and a control section for transmitting to the heating means a command for heating the Ga to an evaporation temperature of Ga or higher and heating the seed crystal to a temperature higher than that of the Ga, wherein the Ga evaporated by the heating means is adapted to react with the nitrogen of a nitrogen component in the gas so as to yield a GaN-forming gas, the GaN-forming gas being adapted to reach the seed-crystal-disposing section. <IMAGE> |
申请公布号 |
EP0937790(A3) |
申请公布日期 |
2003.08.27 |
申请号 |
EP19990101114 |
申请日期 |
1999.01.21 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD.;NISHINO, SHIGEHIRO |
发明人 |
SHIOMI, HIROMU;TATSUMI, MASAMI;NISHINO, SHIGEHIRO |
分类号 |
C30B29/38;C30B23/00;C30B23/02;H01L21/205;H01L33/32 |
主分类号 |
C30B29/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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