发明名称 SURFACE TREATING METHOD, METHOD FOR FORMING ANTIGLARE LAYER, ANTIGLARE LAYER FILM AND ANTIGLARE LOW REFLECTIVE FILM
摘要 <P>PROBLEM TO BE SOLVED: To provide a surface treating method for forming ideal irregularities for antiglaringness on a substrate without passing through complicated steps, a method for forming an antiglare layer, to prepare an antiglare layer film having the formed antiglare layer, and an antiglare low reflective film. <P>SOLUTION: The surface of a substance to be treated which has a heterogeneous composition by a plurality of substances having different plasma resistances at least in the neighborhood of its surface is subjected to the atmospheric plasma treatment for exposure to a reactive gas in a plasma state at atmospheric pressure or under a pressure near atmospheric pressure to form irregularities and voids on the surface of the substance to be treated. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003238713(A) 申请公布日期 2003.08.27
申请号 JP20020043512 申请日期 2002.02.20
申请人 KONICA CORP 发明人 TODA YOSHIRO;FUKUDA KAZUHIRO;KONDO YOSHIKAZU;OISHI KIYOSHI;NISHIWAKI AKIRA
分类号 H05H1/46;C08J7/00;G02F1/1335 主分类号 H05H1/46
代理机构 代理人
主权项
地址