发明名称 |
SURFACE TREATING METHOD, METHOD FOR FORMING ANTIGLARE LAYER, ANTIGLARE LAYER FILM AND ANTIGLARE LOW REFLECTIVE FILM |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a surface treating method for forming ideal irregularities for antiglaringness on a substrate without passing through complicated steps, a method for forming an antiglare layer, to prepare an antiglare layer film having the formed antiglare layer, and an antiglare low reflective film. <P>SOLUTION: The surface of a substance to be treated which has a heterogeneous composition by a plurality of substances having different plasma resistances at least in the neighborhood of its surface is subjected to the atmospheric plasma treatment for exposure to a reactive gas in a plasma state at atmospheric pressure or under a pressure near atmospheric pressure to form irregularities and voids on the surface of the substance to be treated. <P>COPYRIGHT: (C)2003,JPO |
申请公布号 |
JP2003238713(A) |
申请公布日期 |
2003.08.27 |
申请号 |
JP20020043512 |
申请日期 |
2002.02.20 |
申请人 |
KONICA CORP |
发明人 |
TODA YOSHIRO;FUKUDA KAZUHIRO;KONDO YOSHIKAZU;OISHI KIYOSHI;NISHIWAKI AKIRA |
分类号 |
H05H1/46;C08J7/00;G02F1/1335 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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