发明名称 RESIST STRIPPER SOLUTION COMPOSITION
摘要 PURPOSE: A resist stripper solution composition is provided, which is improved in the resist stripping property, does not damage an O-ring or corrode the metal under layer and is low volatile. CONSTITUTION: The resist stripper solution composition comprises 5-50 wt% of at least one product obtained by reacting alkyl acetoacetate or acetic acid with fatty acid amine; 50-95 wt% of a solvent selected from the group consisting of water, 25% tetramethylammonium hydroxide aqueous solution, glycol and an organic polar solvent. Preferably the alkyl acetoacetate is methyl acetoacetate or ethyl acetoacetate; the fatty acid amine is monoethanolamine, isopropanolamine, diethanolamine, dimethylaminoethanol or dimethylethanol; the glycol is ethylene glycol monomethylether, ethylene glycol monobutylether, butyl carbitol, ethyl carbitol, dipropylene glycol monomethylether, dipropylene glycol monoethylether, or triethylene glycol; and the organic polar solvent is N-methyl pyrrolidone, dimethyl sulfoxide or dimethyl acetamide.
申请公布号 KR20030069266(A) 申请公布日期 2003.08.27
申请号 KR20020008730 申请日期 2002.02.19
申请人 DUKSUNG CO., LTD. 发明人 CHOI, HO SEONG;KIM, JI HONG;KIM, TAE GEUN;PARK, HAE SEONG;YEO, SANG HYEOK
分类号 C11D7/26;C11D7/32;C11D7/34;C11D7/50;G03F7/42;H01L21/306;H01L21/311;(IPC1-7):G03F7/42 主分类号 C11D7/26
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