发明名称 APPARATUS FOR CONTROLLING RESIDUAL HYDROGEN PEROXIDE CONCENTRATION
摘要 <P>PROBLEM TO BE SOLVED: To provide a apparatus for controlling the residual hydrogen peroxide concentration in which the residual hydrogen peroxide concentration in treated water is controlled to equal to or below a fixed value by applying a biosensor or using an oxidation-reduction potentiometer. <P>SOLUTION: In the control of the residual hydrogen peroxide concentration in water treated by adding hydrogen peroxide into water to be treated in a hydrogen peroxide addition vessel and bringing the water to be treated into gas-liquid contact with ozone gas in an ozone reaction vessel, the residual concentration control apparatus is provided with a chemical injection pump capable of controlling the addition quantity of hydrogen peroxide, a flowmeter for detecting the flow rate of the water to be treated, a biosensor for outputting a signal corresponding to the hydrogen peroxide concentration of the treated water flowing out from the ozone reaction vessel and a controller for controlling the chemical injection pump based on the outputted signal of the biosensor and the flow rate signal of the flowmeter to make the residual hydrogen peroxide concentration in the treated water equal to or below a prescribed value. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003236566(A) 申请公布日期 2003.08.26
申请号 JP20020041978 申请日期 2002.02.19
申请人 TOSHIBA CORP 发明人 TAGUCHI KENJI;KUBO KIE;MURAYAMA SEIICHI;IYASU KYOTARO;ABE NORIMITSU;SUZUKI SETSUO;HARAGUCHI SATOSHI
分类号 G01N27/26;C02F1/32;C02F1/72;C02F1/78;G01N27/416 主分类号 G01N27/26
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