发明名称 HOLDING APPARATUS FOR BODY TO BE TREATED
摘要 <p><P>PROBLEM TO BE SOLVED: To solve the problem that ceramic as the function material of a heating mechanism is hardly desired since the ceramic used as the constitution material of the heating mechanism is superior in resistance to contamination, resistance to heat, etc., in a conventional holding apparatus of a body to be treated. <P>SOLUTION: The holding device is provided with a heating resistor 11 for heating a wafer, an insulation body 12 supporting the heating resistor 11, a heat conductor 13 arranged superposed on the insulation body 12 and supporting the wafer, and a bolt (not shown) for connecting and integrating the heat conductor 13 and the insulation body 12 by their respective peripheral parts. <P>COPYRIGHT: (C)2003,JPO</p>
申请公布号 JP2003234397(A) 申请公布日期 2003.08.22
申请号 JP20020031556 申请日期 2002.02.07
申请人 TOKYO ELECTRON LTD 发明人 NAGASEKI KAZUYA;MURAKAMI KOICHI;KAMIGOORI AKIKO
分类号 H01L21/683;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/683
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