| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device capable of restraining a temperature distribution in a projection optical system by a simple constitution and effecting exposure with good accuracy. SOLUTION: The exposure device EX is a scanning exposure device wherein a mask M and a substrate P are moved synchronously to transfer the pattern PA of the mask M onto the substrate P through an projection optical system PL. The scanning exposure device EX is provided with a mirror tube K, retaining a projection lens E constituting the projection optical system PL, and a plurality of heat sinks 7 installed at least at two places in a direction intersecting with the synchronously moving direction in the flange unit 2 of the mirror tube K and capable of independently adjusting temperatures at least at the two places. COPYRIGHT: (C)2003,JPO
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