| 摘要 |
PROBLEM TO BE SOLVED: To reduce the variation of the progress of development at the time of manufacturing a laminated chip component by using a photolithographic method. SOLUTION: On a substrate 24, marks 28 for confirming the progress of development including disappearing confirmation areas 28c and 28d which disappear when the progress of development becomes a standard progress and remaining confirmation areas 28a and 28b which remain when the progress of development becomes the standard progress. Consequently, it can be discriminated that the progress of development falls within the range of the standard progress when only the areas 28c (and 28d) disappear, and that the development is insufficient when the areas 28c (and 28d) remain (Fig. 3 (c)). When the remaining confirmation areas 28b (and 28a) disappear (Fig. 3 (d)), the development can be discriminated as overdevelopment. COPYRIGHT: (C)2003,JPO |
