发明名称 Device for processing semiconductor wafers
摘要 Device for processing semiconductor wafers, comprising at least one processing chamber which is completely closed with the exception of a connection to a distribution. System. In said at least one processing chamber there are situated preferably two reactors and a common feed/removal system in order to be able to subject wafers, which may optionally be arranged in boats, to an identical processing operation.
申请公布号 US6607602(B1) 申请公布日期 2003.08.19
申请号 US19990355509 申请日期 1999.10.12
申请人 ASM INTERNATIONAL N.V. 发明人 GRANNEMAN ERNST HENDRIK AUGUST;HASPER ALBERT;ZINGER JAN
分类号 H01L21/302;B65G49/07;H01L21/205;H01L21/31;H01L21/324;H01L21/677;(IPC1-7):C23C16/00;H01L21/00;B65G69/00 主分类号 H01L21/302
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