发明名称 PHOTOSENSITIVE POLYIMIDE PRECURSOR, PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER, LIQUID CRYSTAL DRIVE SIDE- SUBSTRATE, AND LIQUID CRYSTAL PANEL
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition desirable for forming a fine pattern, especially, the detail of a color filter, and to provide a photosensitive resin composition containing the same, a color filer, a liquid crystal drive side-substrate, and a liquid crystal panel the detail of each of which is made from the resin composition. <P>SOLUTION: The photosensitive resin composition is prepared by formulating a main polymer being a photosensitive polyimide precursor obtained by reacting a polyamic acid having the structure represented by formula 1 with a radically polymerizable group-containing monoglycidyl isocyanurate compound or a radically polymerizable group-containing alicyclic epoxy compound with a polyfunctional radically polymerizable compound and a photopolymerization initiator. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003231752(A) 申请公布日期 2003.08.19
申请号 JP20020034721 申请日期 2002.02.12
申请人 TOYOBO CO LTD;DAINIPPON PRINTING CO LTD 发明人 NISHIO AKITAKA;HAYASHI SHINJI;SEGA SHUNSUKE;ITO TAKESHI;NAKAO JUNICHI;INUKAI TADASHI
分类号 G03F7/027;C08F290/14;C08G73/10;G02B5/20 主分类号 G03F7/027
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