| 摘要 |
Disclosed herein is a plasma-etching electrode plate in the form of flat glassy carbon plate which is characterized by flatness with a warp smaller than 0.3 mm. This flatness permits the electrode plate to have a uniform surface temperature distribution which contributes to uniform etching on semiconductor wafers. The electrode plate is a glassy carbon plate obtained from one or more of thermosetting resin having a carbon yield higher than 20%. |
