发明名称 METHOD FOR MANUFACTURING ITO TRANSPARENT CONDUCTIVE THIN FILM BY MOD PROCESS
摘要 PURPOSE: A method for manufacturing ITO (indium tin oxide) transparent conductive thin film using MOD (metal-organic decomposition) process is provided to improve moisture stability by using hydrophobic solvent and obtain thin film without cracks by generating polymerization reaction after all solvent is evaporated even in drying process. CONSTITUTION: The method for manufacturing ITO transparent conductive thin film comprises the steps of mixing raw materials with common solvent in a mixing certain ratio; heating and stirring the mixture; synthesizing the reactant into sol in reactor; coating a product on substrate; and drying and heat treating the obtained product, wherein the sol is coated on the substrate with viscosity of the synthesized sol being controlled to 10 to 20 mPa·s, wherein the ITO sol is manufactured in such a way that a mole ratio of indium and tin is 1.86:0.14, and wherein the product is heat treated by drying the product coated on the substrate at 300 deg.C after coating the product on the substrate.
申请公布号 KR20030066167(A) 申请公布日期 2003.08.09
申请号 KR20020006456 申请日期 2002.02.05
申请人 CHOI YOUNG KI;WON, CHANG WHAN 发明人 WON, CHANG WHAN
分类号 C23C26/00;(IPC1-7):C23C26/00 主分类号 C23C26/00
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