发明名称 METHOD AND DEVICE FOR PATTERN INSPECTION
摘要 <P>PROBLEM TO BE SOLVED: To detect foreign matter and defects with a high sensitivity and inspect and process them at high speeds by accurately detecting the displaced amount of a comparison image at high speeds in a pattern inspection technology by an image comparison. <P>SOLUTION: An inspected image and a reference image are divided into a plurality of image areas, respectively. By using highly reliable information on positional displacement between the divided images, the amount of positional displacement between both entire images is determined. Also, a calculation area and a calculation order for the amount of the positional displacement and the search area of the images are scheduled beforehand. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003223630(A) 申请公布日期 2003.08.08
申请号 JP20020022144 申请日期 2002.01.30
申请人 HITACHI LTD;TOKYO SEIMITSU CO LTD;HITACHI HIGH TECH CORP 发明人 SAKAI KAORU;MAEDA SHUNJI;OKABE TAKASHI;GOTO HIROSHI;KUWABARA MASAYUKI;TAKEUCHI NAOYA
分类号 G01B11/00;G01N21/956;G06T1/00;G06T7/00;H01L21/66 主分类号 G01B11/00
代理机构 代理人
主权项
地址