发明名称 |
METHOD AND DEVICE FOR PATTERN INSPECTION |
摘要 |
<P>PROBLEM TO BE SOLVED: To detect foreign matter and defects with a high sensitivity and inspect and process them at high speeds by accurately detecting the displaced amount of a comparison image at high speeds in a pattern inspection technology by an image comparison. <P>SOLUTION: An inspected image and a reference image are divided into a plurality of image areas, respectively. By using highly reliable information on positional displacement between the divided images, the amount of positional displacement between both entire images is determined. Also, a calculation area and a calculation order for the amount of the positional displacement and the search area of the images are scheduled beforehand. <P>COPYRIGHT: (C)2003,JPO |
申请公布号 |
JP2003223630(A) |
申请公布日期 |
2003.08.08 |
申请号 |
JP20020022144 |
申请日期 |
2002.01.30 |
申请人 |
HITACHI LTD;TOKYO SEIMITSU CO LTD;HITACHI HIGH TECH CORP |
发明人 |
SAKAI KAORU;MAEDA SHUNJI;OKABE TAKASHI;GOTO HIROSHI;KUWABARA MASAYUKI;TAKEUCHI NAOYA |
分类号 |
G01B11/00;G01N21/956;G06T1/00;G06T7/00;H01L21/66 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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