METHOD FOR FORMING PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a resist pattern without causing any collapse of pattern utilizing a fact that liquid carbon dioxide exhibits high solubility to a substance and a fact that surface tension of supercritical carbon dioxide is negligible. SOLUTION: An exposed substrate having a resist is placed in a pressure container and while keeping the temperature at a level lower than the critical temperature of carbon dioxide, developing is performed with developer comprising liquid carbon dioxide and an alkaline compound, and then the liquid carbon dioxide is substituted for the developer. When the critical temperature of carbon dioxide is reached while keeping the pressure at the critical pressure or above, carbon dioxide is discharged from the pressure container while keeping the temperature at a constant level to bring about normal pressure and then the substrate is taken out from the pressure container. The substrate may be turned when the developer or the liquid carbon dioxide touches the substrate. COPYRIGHT: (C)2003,JPO