PLASMA TREATMENT DEVICE AND PLASMA TREATMENT METHOD

摘要

PROBLEM TO BE SOLVED: To provide a plasma treatment device ensuring homogeneous plasma treatment by grasping high frequency power applied to a plasma excitation electrode accurately thereby controlling exciting power stably. SOLUTION: The plasma treatment device comprises a current detecting means for monitoring a current flowing through a power distributor supplying high frequency power to a plasma excitation electrode (cathode electrode), a means for controlling the output from a high frequency power supply such that a current detected by the current detecting means has a specified level, and a circuit for feeding back a control signal obtained from the control means to the high frequency power supply or a matching circuit in order to regulate power applied to the plasma excitation electrode. COPYRIGHT: (C)2003,JPO