| 摘要 |
<p>A release film having a substrate film and, formed on at least on surface thereof, a release layer, characterized in that the surface of the release layer exhibits a ratio (Si/C) of the presence of a silicon atom to that of a carbon atom of 0.01 or less and also a ratio (X/C) of the presence of a halogen atom to that of a carbon atom of 0.1 or less, and further the release film exhibits a peel strength of 75 mN/cm or less and a residual adhesion percentage of 80 % or more. The release film contains substantially no silicon or a halogen, and is of light release.</p> |
| 申请人 |
MITSUBISHI POLYESTER FILM CORPORATION;TATE, MASASHI;NISHIZAWA, OSAMU;KUNITAKE, MAKI;SEKI, MOTOHIRO |
发明人 |
TATE, MASASHI;NISHIZAWA, OSAMU;KUNITAKE, MAKI;SEKI, MOTOHIRO |
