发明名称 |
Plasma processing device |
摘要 |
In a microwave plasma processing apparatus that uses a radial line slot antenna, abnormal discharges are suppressed and the excitation efficiency of microwave plasma is improved simultaneously. In the joint between the radial line slot antenna and the coaxial waveguide, the point part of the power supplying line of the coaxial waveguide is separated from the slot plate constructing a radiation face.
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申请公布号 |
US2003148623(A1) |
申请公布日期 |
2003.08.07 |
申请号 |
US20020296857 |
申请日期 |
2002.11.27 |
申请人 |
OHMI TADAHIRO;HIRAYAMA MASAKI;SUGAWA SHIGETOSHI;GOTO TETSUYA;HONGOH TOSHIAKI |
发明人 |
OHMI TADAHIRO;HIRAYAMA MASAKI;SUGAWA SHIGETOSHI;GOTO TETSUYA;HONGOH TOSHIAKI |
分类号 |
H05H1/46;C23C16/511;C23F4/00;H01J37/32;H01L21/302;H01L21/3065;H01L21/31;(IPC1-7):H01L21/302;H01L21/461 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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