发明名称 Plasma processing device
摘要 In a microwave plasma processing apparatus that uses a radial line slot antenna, abnormal discharges are suppressed and the excitation efficiency of microwave plasma is improved simultaneously. In the joint between the radial line slot antenna and the coaxial waveguide, the point part of the power supplying line of the coaxial waveguide is separated from the slot plate constructing a radiation face.
申请公布号 US2003148623(A1) 申请公布日期 2003.08.07
申请号 US20020296857 申请日期 2002.11.27
申请人 OHMI TADAHIRO;HIRAYAMA MASAKI;SUGAWA SHIGETOSHI;GOTO TETSUYA;HONGOH TOSHIAKI 发明人 OHMI TADAHIRO;HIRAYAMA MASAKI;SUGAWA SHIGETOSHI;GOTO TETSUYA;HONGOH TOSHIAKI
分类号 H05H1/46;C23C16/511;C23F4/00;H01J37/32;H01L21/302;H01L21/3065;H01L21/31;(IPC1-7):H01L21/302;H01L21/461 主分类号 H05H1/46
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