Gas supply apparatus and gas supply method

摘要

This gas supply apparatus supplies a gas by vaporizing a liquefied gas filled in a gas container. This apparatus includes an installation stand having an upper surface on which the gas container is placed; at least one nozzle which discharges a beating medium towards a bottom surface of the gas container and is provided in a hole formed in the installation stand; and a heating medium discharge path which discharges the heating medium from a space between the bottom surface of the gas container and the upper surface of the installation stand.