METHOD AND APPARATUS FOR MONITORING AND VERIFYING EQUIPMENT STATUS

摘要

An equipment status monitoring system and method of operating thereof . The equipment status monitoring system includes first and second microwave mirrors in a plasma processing chamber each forming a multi−modal resonator. A power source is coupled to the first mirror and configured to produce an excitation signal. A detector is coupled to at least one of the first mirror and the second mirror and configured to measure an excitation signal. A control system is connected to the detector that compares a measured excitation signal to a normal excitation signal in order to determine a status of the material processing equipment.