发明名称 APPARATUS FOR REFINING PROCESS GAS OF FABRICATING SEMICONDUCTOR
摘要 PURPOSE: An apparatus for refining process gas of fabricating a semiconductor is provided to purify the process gas and make the process have ultra high purity by eliminating various impurities like moisture, carbon dioxide, carbon monoxide, hydrogen and methane that are contained in the air. CONSTITUTION: The first pipe(12) is filled with molecular sieve. The second pipes(18) in which alumina balls(24) are installed are formed at both sides of a porous plate(16,17) at both side ends of the first pipe. The third pipes(20) are formed at both sides of filters(26,27) at both side ends of the second pipes. An inflow port(30) of the process gas and an exhaust port(32) of the purified process gas are installed in the intermediate part of the ends of the third pipes.
申请公布号 KR20030063586(A) 申请公布日期 2003.07.31
申请号 KR20020003788 申请日期 2002.01.23
申请人 KOREA PLONICS CO., LTD. 发明人 CHOI, GYEONG HUN;JUNG, JIN HYEONG;LEE, YEONG CHUN;PARK, JEONG SU
分类号 H01L21/02;(IPC1-7):H01L21/02 主分类号 H01L21/02
代理机构 代理人
主权项
地址