发明名称 METHOD OF MANUFACTURING COMPOUND SEMICONDUCTOR FIELD EFFECT TRANSISTOR
摘要 PROBLEM TO BE SOLVED: To provide a compound semiconductor FET which can easily grasp, deduce and adjust environment resistance by using the fact that the environment resistance of the FET fluctuates when the stress of an insulating film formed in the FET fluctuates. SOLUTION: An FET group for capacity test 2, which is constituted of two FETs 3a and 3b having gate electrodes 7a and 7b different in longitudinal directions, is formed on a semiconductor wafer with the FET which is originally manufactured. The capacity of another FET is deduced by grasping a pinch-off voltage difference between FETs 3a and 3b, and the stress of the insulating film formed in a subsequent process is adjusted. Thus, satisfactory environment resistance is obtained. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003218320(A) 申请公布日期 2003.07.31
申请号 JP20020012724 申请日期 2002.01.22
申请人 MURATA MFG CO LTD 发明人 NAKADA HIDEFUMI;HAMADA AKINORI;KINOSHITA HIROSHI;KOBAYASHI ATSUSHI;YOSHIDA KAZUHIRO
分类号 H01L21/822;H01L27/04;H01L27/095;(IPC1-7):H01L27/095 主分类号 H01L21/822
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