| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new superstrong acid onium salt compound which is suitable as a radiation sensitive acid producing agent of a radiation sensitive resin composition to be used as a chemically amplified resist, which has high sensitivity and which can efficiently generates an acid, and to provide a chemically amplifying type positive radiation sensitive resin composition by using the above superstrong acid onium salt compound. <P>SOLUTION: The superstrong onium salt compound is expressed by general formula (1), (2) or (3). The onium salt compound is used for the excellent chemically amplified type positive radiation sensitive resin composition. <P>COPYRIGHT: (C)2003,JPO |
