| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method and apparatus which precisely inspect dust sticking onto an Si stencil mask in a short period of time. <P>SOLUTION: By the mask inspecting method of the present invention, the Si stencil mask 10 is irradiated with probe light from a laser light source 3 and a photodiode 5 detects a probe light 15 scattered by dust 13 sticking onto a hole part 9 of the mask 10. The wavelength of the probe light is≥1,000 nm. Light of≥1μm in wavelength passes through Si of up to about 1 mm in thickness, so a membrane part 11 of the Si stencil mask 10 passes light and shows transmissivity different from Si for a carbon or metal particle as the dust 13. Thus, the difference in light transmissivity between the mask and dust is judged to precisely detect the dust. <P>COPYRIGHT: (C)2003,JPO</p> |
