| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a pattern inspection apparatus and a method for it which can finely set an area where a high accuracy inspection is required, suppress detection of untrue defects and rapidly inspect a pattern. <P>SOLUTION: A plurality of mask patterns are superposed and the area where the high accuracy inspection is required can be easily and rapidly set as a fine selected area comprising a superimposed area and its vicinity. Or the detection of the untrue defects can be suppressed and the pattern can be rapidly inspected by setting the selected area to reference data by using a conversion part, reading a predetermined threshold corresponding to inspection accuracy of each area and determining and detecting the defects. <P>COPYRIGHT: (C)2003,JPO</p> |
