| 发明名称 |
Temperature controlled chamber |
| 摘要 |
A substrate processing chamber 25 comprising a substrate support 85, and a wall 24 about the substrate support 85, the wall 24 having a radiation absorbing surface 36 adapted to preferentially absorb radiation having wavelengths in the visible or infra-red spectrum.
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| 申请公布号 |
US6598559(B1) |
申请公布日期 |
2003.07.29 |
| 申请号 |
US20000534834 |
申请日期 |
2000.03.24 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
VELLORE KIM;LIANG QIWEI;POLAR ERWIN |
| 分类号 |
C23C16/48;H01L21/00;(IPC1-7):C23C16/00;C23F1/02 |
主分类号 |
C23C16/48 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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