POSITIVE PHOTOSENSITIVE COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a positive photosensitive composition which is improved inline edge roughness and excellent in profile.

SOLUTION: The positive photosensitive composition is characterized in containing (A1) at least one compound which generates an aromatic sulfonic acid substituted by at least one fluorine atom and/or a group having at least one fluorine atom upon irradiation with an actinic ray or a radiation, (A2) an onium salt of an alkanesulfonic acid in which the α-position of the sulfonic acid is not substituted by a fluorine atom and/or an onium salt of a carboxylic acid and (B) a resin which has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution.

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