| 发明名称 |
EMISSIVITY-CHANGE-FREE PUMPING PLATE KIT IN A SINGLE WAFER CHAMBER |
| 摘要 |
An apparatus that includes a pumping plate (812) having a skirt (822), where the skirt contains a number of holes (828) and a water access slot, and where the number of holes are sized and positioned to provide uniform heating of a susceptor (806).
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| 申请公布号 |
WO03060189(A1) |
申请公布日期 |
2003.07.24 |
| 申请号 |
WO2003US01347 |
申请日期 |
2003.01.15 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
JIN, XIAOLIANG;WANG, SHULIN;LUO, LEE;HO, HENRY;CHEN, STEVEN, A. |
| 分类号 |
C23C16/455;C23C16/44;C23C16/46;H01L21/00;H01L21/205;(IPC1-7):C23C16/455 |
主分类号 |
C23C16/455 |
| 代理机构 |
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