发明名称 |
Water and method for storing silicon wafer |
摘要 |
There is provided a storage water of a silicon wafer wherein a liquid temperature of the storage water is 0 to 18° C. And there is provided a shower water of a silicon wafer wherein a liquid temperature of the shower water is 0 to 18° C. The wafer is stored in the storage water, and showered using the shower water. The present invention also relates to a method for storing silicon wafer wherein the silicon wafer is showered using a shower water of which liquid temperature is 0 to 18° C., and is then stored in liquid using a storage water of which liquid temperature is 0 to 18° C. Thereby, there can be provided a water for storing a silicon wafer, a method for storing it, a water for showering it and a method for showering it wherein degradation of the wafer quality can be prevented.
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申请公布号 |
US2003139067(A1) |
申请公布日期 |
2003.07.24 |
申请号 |
US20020276483 |
申请日期 |
2002.03.11 |
申请人 |
ABE TATSUO;KANAZAWA KENICHI;MIYASHITA AKIRA;KASHIMURA NORIO |
发明人 |
ABE TATSUO;KANAZAWA KENICHI;MIYASHITA AKIRA;KASHIMURA NORIO |
分类号 |
H01L21/00;H01L21/02;H01L21/302;H01L21/304;H01L21/306;H01L21/461;(IPC1-7):H01L21/461 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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