发明名称 Photothermographic material
摘要 Disclosed is a photothermographic material having one or more image-forming layer and one or more layers on the outermost image-forming layer, wherein at least one of the layers on the outermost image-forming layer is a non-photosensitive layer having a thickness of 2.8-8 mum and at least one layer prepared by applying a coating solution containing 30 weight % or more of an organic solvent is formed between the support and the non-photosensitive layer. The photothermographic material shows little fluctuation of image line width and little generation of density unevenness and can form an image of high contrast and high maximum density with heat development under a highly humid environment.
申请公布号 US2003138744(A1) 申请公布日期 2003.07.24
申请号 US20020209924 申请日期 2002.08.02
申请人 ITO TADASHI 发明人 ITO TADASHI
分类号 G03C1/76;G03C1/005;G03C1/06;G03C1/498;G03C1/74;(IPC1-7):G03C1/498 主分类号 G03C1/76
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