| 发明名称 |
METHODS FOR PLANARIZATION OF GROUP VIII METAL-CONTAINING SURFACES USING OXIDIZING GASES |
| 摘要 |
A planarization method includes providing a second and/or third Group VIII metal-containing surface (preferably, a platinum-containing surface) and positioning it for contact with a polishing surface in the presence of a planarization composition that includes an oxidizing gas. |
| 申请公布号 |
WO03060980(A2) |
申请公布日期 |
2003.07.24 |
| 申请号 |
WO2002US40407 |
申请日期 |
2002.12.17 |
| 申请人 |
MICRON TECHNOLOGY, INC. |
发明人 |
UHLENBROCK, STEFAN;WESTMORELAND, DONALD, L. |
| 分类号 |
B24B37/00;C09G1/02;C23F3/00;H01L21/304;H01L21/3205;H01L21/321;H01L21/768;H01L21/8242;H01L21/8246;H01L27/105;H01L27/108 |
主分类号 |
B24B37/00 |
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