发明名称 Semiconductor device and method of manufacturing the same
摘要 Disclosed herein is a semiconductor device comprising a substrate having a first area on which a semiconductor element is mounted, a second area which surrounds the first area, and a third area located in a central portion of the first area; wirings extending from the second area to the third area and formed over the substrate; an insulting film which is formed in the first and second areas so as to expose the third area and covers the substrate and the wirings; and the semiconductor element which is electrically connected to the wirings within the third area and which has a size equal to the first area and is mounted on the first area so as to be spaced a predetermined interval from the insulating film.
申请公布号 US2003137034(A1) 申请公布日期 2003.07.24
申请号 US20030345319 申请日期 2003.01.16
申请人 KOBAYASHI KANAME 发明人 KOBAYASHI KANAME
分类号 H01L21/56;H01L21/60;H01L23/498;H01L23/60;(IPC1-7):H01L23/495 主分类号 H01L21/56
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