| 摘要 |
<p>A photosensitive resin composition comprising (A) a resin curable with actinic radiation, (B) a photopolymerization initiator, (C) a reactive diluent, and (D) an epoxy compound, wherein the resin (A) is composed of (a) a prepolymer produced by esterifying a novolak-type epoxy compound with an unsaturated carboxylic acid and reacting the resulting epoxy-esterification product with a saturated or unsaturated polybasic acid anhydride, (b) a prepolymer produced by esterifying a bisphenol-type epoxy compound with an unsaturated carboxylic acid and reacting the resulting epoxy-esterification product with a saturated or unsaturated polybasic acid anhydride, and (c) a prepolymer produced by reacting an unsaturated monobasic acid copolymer resin with an alicyclic epoxy-containing unsaturated compound.</p> |
