发明名称 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus with reduced a problem of outgassing of the material used for conduit, provided to supply utility to a movable element inside a vacuum chamber. <P>SOLUTION: There is provided the lithographic projection apparatus, in which the conduit is provided with a flexible metal bellows, to prevent outgassing due to the vacuum condition within the vacuum chamber, and the movable element may be moved with at least a first degree of freedom. <P>COPYRIGHT: (C)2003,JPO</p>
申请公布号 JP2003203862(A) 申请公布日期 2003.07.18
申请号 JP20020382724 申请日期 2002.11.27
申请人 ASML NETHERLANDS BV 发明人 JACOBS HERNES;VOSTERS PIET;HOL SVEN ANTOLN JOHAN;VAN DER SCHOOT HARMEN KLAAS;VAN DIESEN ROBERT JOHANNES P;CALLAN DAVID WILLIAM
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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