| 摘要 |
PROBLEM TO BE SOLVED: To correct distortions of a pattern projected on a wafer with high accuracy, produced due to the planar shape or the like of a reticle that is held by a reticle stage. SOLUTION: In a scanning aligner, an optical element G1 is held by a reticle stage RST, and this is moved together with a reticle R. The optical element G1 is worked so as to correct the distortions due to the planar shape of the reticle R held by the reticle stage RST. COPYRIGHT: (C)2003,JPO
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