| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma treatment device, that is able to prevent generation of an abnormal discharge around a member or the like for a planar antenna. <P>SOLUTION: The plasma treatment device includes a treatment vessel 32, of which the inside is arranged so that evacuation can be conducted with its ceiling open; an insulating plate 74 hermetically installed on an opening of the ceiling of the treatment vessel, a placement stand 34 provided within the treatment vessel to place a W to be treated, the member 78 for the planar antenna that is provided at the upper part of the insulating plate to introduce microwaves for generation of plasma into the treatment vessel, transmitting it through the insulating plate from a plurality of microwave radiating holes 98 formed with a predetermined pitch; a wave retarding material 80 provided on the upper part of the member for the plane antenna to shorten the wavelength of the microwave; and gas feed means 48, 50 to introduce a given gas into the treatment vessel, wherein a Faraday shield electrode means 77 of a comb-teeth shape is provided between a peripheral portion of the member for the planar antenna and a peripheral portion of a plasma-forming region within the treatment vessel. <P>COPYRIGHT: (C)2003,JPO |
