| 摘要 |
PROBLEM TO BE SOLVED: To provide a reaction tube construction for a semiconductor manufacturing device by which a quality thin film is grown in a high cleanliness atmosphere, and especially uniformity of B concentration can be improved. SOLUTION: In the semiconductor manufacturing device, the distance between a reaction tube (1) constituting a reaction chamber and a boat (9) retaining a wafer (8) is set as short as possible, a nozzle portion to introduce a process gas is provided between the reaction tube (1) and the boat (9), and a nozzle projected portion (7) that is caused to project outside the reaction tube (1) is provided on the inner wall of the reaction tube (1) so that the nozzle portion can be housed. The device has this reaction tube. COPYRIGHT: (C)2003,JPO
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