发明名称 |
METHOD OF ACCURATELY MEASURING COMPOSITIONS OF THIN FILM SHAPE MEMORY ALLOYS |
摘要 |
A method of measuring with high accuracy the composition of shape memory alloy elements that are sputter deposited in thin film form. An element of known composition is polished with a flat surface. An element of unknown composition is sputter deposited onto the surface. Miniature openings are made by photography in the unknown layer, exposing an area of the known substrate. With adjacent areas of the two samples then only microns apart, accurate measurements of the compositions are made by comparing the X-ray spectra resulting from an electron beam scanning across the two areas.
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申请公布号 |
US2003134440(A1) |
申请公布日期 |
2003.07.17 |
申请号 |
US20020051849 |
申请日期 |
2002.01.17 |
申请人 |
JOHNSON A. DAVID;MARTYNOV VALERY |
发明人 |
JOHNSON A. DAVID;MARTYNOV VALERY |
分类号 |
G01N23/225;H01L21/66;(IPC1-7):H01L21/66 |
主分类号 |
G01N23/225 |
代理机构 |
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代理人 |
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地址 |
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