Cyclic sulfonium and sulfoxonium photoacid generators and photoresists comprising same

摘要

New photoacid generator compounds ("PAGs") are provided and photoresist compositions that comprise such compounds. In particular, cyclic sulfonium and sulfoxonium PAGs are provided. PAGs of the invention are particularly useful as photoactive components of photoresists imaged at short wavelengths such as 248 nm, 193 nm and 157 nm.