发明名称 Method for fabricating semiconductor device
摘要 The object of the invention is to provide a method for fabricating a semiconductor device having a peeled layer bonded to a base material with curvature. Particularly, the object is to provide a method for fabricating a display with curvature, more specifically, a light emitting device having an OLED bonded to a base material with curvature. An external force is applied to a support originally having curvature and elasticity, and the support is bonded to a peeled layer formed over a substrate. Then, when the substrate is peeled, the support returns into the original shape by the restoring force, and the peeled layer as well is curved along the shape of the support. Finally, a transfer object originally having curvature is bonded to the peeled layer, and then a device with a desired curvature is completed.
申请公布号 US2003134488(A1) 申请公布日期 2003.07.17
申请号 US20020334076 申请日期 2002.12.27
申请人 YAMAZAKI SHUNPEI;MURAKAMI MASAKAZU;TAKAYAMA TORU;MARUYAMA JUNYA 发明人 YAMAZAKI SHUNPEI;MURAKAMI MASAKAZU;TAKAYAMA TORU;MARUYAMA JUNYA
分类号 H01L21/00;H01L21/20;H01L21/762;H01L51/00;H01L51/40;H01L51/56;(IPC1-7):H01L21/00;H01L21/30;H01L21/46 主分类号 H01L21/00
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