| 发明名称 |
Lithographic apparatus and device manufacturing method |
| 摘要 |
A lithographic projection apparatus, in which movement of a substrate table in a plane is accomplished by a planar magnetic positioning device, has a mechanical limiter that limits rotation of the substrate table about a direction orthogonal to the plane.
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| 申请公布号 |
US2003132400(A1) |
申请公布日期 |
2003.07.17 |
| 申请号 |
US20020314447 |
申请日期 |
2002.12.09 |
| 申请人 |
ASML NETHERLANDS, B.V. |
发明人 |
JACOBS HERNES;VAN DER SCHOOT HARMEN KLAAS;VOSTERS PETRUS MATTHIJS HENRICUS;DE GROOT TON |
| 分类号 |
G03F7/20;H01L21/027;H01L21/68;(IPC1-7):G21K5/10 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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