发明名称 PHOTOSENSITIVE POLYMER HAVING EXCELLENT COMPATIBILITY AND PREPARATION THEREOF
摘要 PURPOSE: A photosensitive polymer having high compatibility with other polymers such as polymethylmethacrylate is provided to improve the glass transition temperature and thermal stability. CONSTITUTION: The photosensitive polymer is represented by the following formula 1, wherein R is hydrogen or a C1-C4 lower alkyl, X is a halogen atom, a is an integer ranged from 220 to 350, b is an integer ranged from 90 to 190 and c is an integer ranged from 280 to 370. The photosensitive polymer can be prepared by synthesizing a photosensitive polymer from a cinnamoyl halide-glycidyl acrylate-styrene copolymer at a low temperature under atmospheric pressure in a short time, and adding carbon dioxide thereto under atmospheric pressure in the presence of a phase transfer catalyst and an organic solvent to form a photosensitive terpolymer having 5-membered ring carbonate groups.
申请公布号 KR20030060161(A) 申请公布日期 2003.07.16
申请号 KR20020000698 申请日期 2002.01.07
申请人 PAKR, DAE WON 发明人 PAKR, DAE WON;PARK, HUI YEONG;PARK, SANG UK
分类号 C08F220/10;(IPC1-7):C08F220/10 主分类号 C08F220/10
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