发明名称 |
PHOTOSENSITIVE POLYMER HAVING EXCELLENT COMPATIBILITY AND PREPARATION THEREOF |
摘要 |
PURPOSE: A photosensitive polymer having high compatibility with other polymers such as polymethylmethacrylate is provided to improve the glass transition temperature and thermal stability. CONSTITUTION: The photosensitive polymer is represented by the following formula 1, wherein R is hydrogen or a C1-C4 lower alkyl, X is a halogen atom, a is an integer ranged from 220 to 350, b is an integer ranged from 90 to 190 and c is an integer ranged from 280 to 370. The photosensitive polymer can be prepared by synthesizing a photosensitive polymer from a cinnamoyl halide-glycidyl acrylate-styrene copolymer at a low temperature under atmospheric pressure in a short time, and adding carbon dioxide thereto under atmospheric pressure in the presence of a phase transfer catalyst and an organic solvent to form a photosensitive terpolymer having 5-membered ring carbonate groups.
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申请公布号 |
KR20030060161(A) |
申请公布日期 |
2003.07.16 |
申请号 |
KR20020000698 |
申请日期 |
2002.01.07 |
申请人 |
PAKR, DAE WON |
发明人 |
PAKR, DAE WON;PARK, HUI YEONG;PARK, SANG UK |
分类号 |
C08F220/10;(IPC1-7):C08F220/10 |
主分类号 |
C08F220/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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