发明名称 Pellicle for use in small wavelength lithography and a method for making such a pellicle using polymer films
摘要 A pellicle utilizes a thin film attached to a frame. The film is relatively transparent to radiation. The frame is coupled to a periphery of the film and is exclusive of the center portion of the film. The pellicle can be manufactured by growing a relatively transparent film on a silicon substrate and removing the substrate to expose at least a portion of the relatively transparent film.
申请公布号 US6593035(B1) 申请公布日期 2003.07.15
申请号 US20010771236 申请日期 2001.01.26
申请人 ADVANCED MICRO DEVICES, INC. 发明人 LEVINSON HARRY J.;LYONS CHRISTOPHER F.
分类号 G03F1/14;(IPC1-7):G03F9/00;A47G1/12 主分类号 G03F1/14
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