发明名称 |
Pellicle for use in small wavelength lithography and a method for making such a pellicle using polymer films |
摘要 |
A pellicle utilizes a thin film attached to a frame. The film is relatively transparent to radiation. The frame is coupled to a periphery of the film and is exclusive of the center portion of the film. The pellicle can be manufactured by growing a relatively transparent film on a silicon substrate and removing the substrate to expose at least a portion of the relatively transparent film.
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申请公布号 |
US6593035(B1) |
申请公布日期 |
2003.07.15 |
申请号 |
US20010771236 |
申请日期 |
2001.01.26 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
LEVINSON HARRY J.;LYONS CHRISTOPHER F. |
分类号 |
G03F1/14;(IPC1-7):G03F9/00;A47G1/12 |
主分类号 |
G03F1/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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