| 摘要 |
PURPOSE: A quartz jacket is provided to be capable of uniformly flowing process gas under a semiconductor device manufacturing process by improving the structure of the quartz jacket. CONSTITUTION: A reaction chamber is provided with a lower metal chamber wall(100), a quartz dome(110) located on the upper portion of the lower metal chamber wall, an O-ring(120) installed between the lower metal chamber wall and the quartz dome for conserving an airproof state, a susceptor(140) capable of moving up and down, installed in the reaction chamber for loading a semiconductor wafer(130), a slot valve(150) installed at the predetermined portion of the lower metal chamber wall, and a circular quartz jacket(160a) connected through an attaching bar(170) to the susceptor. Preferably, the quartz jacket is attached to the susceptor by using at least two attaching bars.
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