| 摘要 |
PROBLEM TO BE SOLVED: To provide an improved alignment system, or especially an alignment system which is hardly affected by results dependent on processes. SOLUTION: An off-axis positioning system included in a lithographic projection device uses wide-band radiation for illuminating a phase grating on a wafer. A wide-band radiation source may comprise fluorescent materials, for instance, a Yag:Ce or ND:Yag crystals illuminated by exciting light. COPYRIGHT: (C)2003,JPO
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