发明名称 |
SEMICONDUCTOR DEVICE AND METHOD FOR INSPECTING SEMICONDUCTOR MEMORY DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a semiconductor device having a circuit for CBCM whose capacity can be accurately measured. <P>SOLUTION: A MOS transistor constituting the circuit for CBCM has the following structure. Source/drain regions 4 and 4' are selectively formed in the surface of a body region 16 and extension regions 5 and 5' extending from the extremity of the source/drain regions 4 and 4' which are opposed to each other are respectively formed. A gate insulating film 7 is formed between the source/drain regions 4 and 4' including the extension regions 5 and 5' and a gate electrode 8 is formed on the gate insulating film 7. However, the region corresponding to pocket regions 6 (6') in a conventional structure more heavily doped than a channel region is not formed at the end of the extension regions 5 (5') and on the periphery of the extension region 5. <P>COPYRIGHT: (C)2003,JPO |
申请公布号 |
JP2003197751(A) |
申请公布日期 |
2003.07.11 |
申请号 |
JP20010391667 |
申请日期 |
2001.12.25 |
申请人 |
MITSUBISHI ELECTRIC CORP;MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
KUNIKIYO TATSUYA;NAGAHISA KATSUMI;YAMASHITA KYOJI;OTANI KAZUHIRO;UMIMOTO HIROYUKI;KOBAYASHI MUTSUMI |
分类号 |
H01L21/76;H01L21/822;H01L21/8238;H01L21/8242;H01L27/04;H01L27/08;H01L27/092;H01L27/10;H01L27/108;H01L29/10;H01L29/78 |
主分类号 |
H01L21/76 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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