发明名称 ABNORMALITY DETECTION METHOD, EXPOSING METHOD AND ALIGNER, AND METHOD FOR MANUFACTURING DEVICE
摘要 PROBLEM TO BE SOLVED: To improve the productivity of a device. SOLUTION: A movement standard deviation signal is calculated on a synchronization difference signal that is detected at a specified interval during synchronized movement of a mask and a substrate and frequency analysis and time- series analysis are performed (steps 152 and 164). Then, the presence or absence of a first abnormality independent of the position of the mask and substrate and a second abnormality dependent thereon is judged on the basis of the results (steps 154 and 166). As a result, in case when the first abnormality is present, it, is corrected (step 160) to prevent the occurrence of defective shot, and in case when the second abnormality is present, a device is stopped for appropriate measures such as repair or the like to reduce downtime of the device or to avoid unnecessary exposing operation. Therefore, the operational efficiency of the device can be improved without reducing yield of the device as a final product, improving the productivity thereof. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003197509(A) 申请公布日期 2003.07.11
申请号 JP20010397780 申请日期 2001.12.27
申请人 NIKON CORP 发明人 MAZAKI KAZUO
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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