发明名称 |
Synthetic quartz glass ingot, synthetic quartz glass, and methods of manufacture thereof |
摘要 |
In a synthetic quartz glass ingot which is produced by vapor phase hydrolyzing or oxidatively decomposing a silica-forming starting compound in an oxyhydrogen flame such that silica growth in a direction occurs at a silica particle deposition and melting face, striae visible when viewed from a direction perpendicular to the silica growth direction are distributed periodically over the silica growth direction. The ingot can be used in the production of optical-grade high-homogeneity synthetic quartz glass elements for excimer laser applications, particularly ArF excimer laser applications, in the production of laser damage-resistant optical elements used with light sources such as excimer lasers, and in the production of UV optical fiber.
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申请公布号 |
US2003126889(A1) |
申请公布日期 |
2003.07.10 |
申请号 |
US20020315984 |
申请日期 |
2002.12.11 |
申请人 |
OTSUKA HISATOSHI;SHIROTA KAZUO |
发明人 |
OTSUKA HISATOSHI;SHIROTA KAZUO |
分类号 |
G02B1/02;C03B8/04;C03B19/14;C03B20/00;C03C3/06;C03C4/00;(IPC1-7):C03B37/018 |
主分类号 |
G02B1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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