发明名称 Synthetic quartz glass ingot, synthetic quartz glass, and methods of manufacture thereof
摘要 In a synthetic quartz glass ingot which is produced by vapor phase hydrolyzing or oxidatively decomposing a silica-forming starting compound in an oxyhydrogen flame such that silica growth in a direction occurs at a silica particle deposition and melting face, striae visible when viewed from a direction perpendicular to the silica growth direction are distributed periodically over the silica growth direction. The ingot can be used in the production of optical-grade high-homogeneity synthetic quartz glass elements for excimer laser applications, particularly ArF excimer laser applications, in the production of laser damage-resistant optical elements used with light sources such as excimer lasers, and in the production of UV optical fiber.
申请公布号 US2003126889(A1) 申请公布日期 2003.07.10
申请号 US20020315984 申请日期 2002.12.11
申请人 OTSUKA HISATOSHI;SHIROTA KAZUO 发明人 OTSUKA HISATOSHI;SHIROTA KAZUO
分类号 G02B1/02;C03B8/04;C03B19/14;C03B20/00;C03C3/06;C03C4/00;(IPC1-7):C03B37/018 主分类号 G02B1/02
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