COATING MATERIAL FOR PATTERN FINENESS ENHANCEMENT AND METHOD OF FORMING FINE PATTERN WITH THE SAME

摘要

A coating material for pattern fineness enhancement which is used for forming a fine pattern by a method comprising applying it to a substrate having photoresist patterns, narrowing the distance between the photoresist patterns based on the heat shrinkage of the coating, and then substantially completely removing the coating, characterized by comprising a a water-soluble polymer and b a water-soluble crosslinking agent having at least one nitrogen atom in the structure and a method of forming a fine pattern with the coating material. The coating material has the excellent ability to control pattern dimensions and can give a fine pattern having a satisfactory profile and satisfying requirements for a semiconductor device.