发明名称 Silicon-on-insulator (SOI)electrostatic discharge (ESD) protection device with backside contact plug
摘要 An electrostatic discharge (ESD) protection device for a silicon-on-insulator (SOI) integrated circuit having a silicon substrate with a buried oxide layer disposed thereon and an active layer disposed on the buried oxide layer having active regions defined by isolation trenches. The ESD protection device is formed on the SOI integrated circuit and has an anode and a cathode formed within one of the active regions and coupled respectively to a first and a second node; and a backside contact plug adjacent and in thermal contact with at least one of the anode or the cathode, the backside contact plug traversing the buried oxide layer to thermally couple the one of the active regions and the substrate.
申请公布号 US6589823(B1) 申请公布日期 2003.07.08
申请号 US20010792138 申请日期 2001.02.22
申请人 ADVANCED MICRO DEVICES, INC. 发明人 BEEBE STEPHEN G.;KRISHNAN SRINATH;KRIVOKAPIC ZORAN
分类号 H01L21/00;H01L27/02;(IPC1-7):H01L21/00 主分类号 H01L21/00
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