发明名称 |
APPARATUS FOR POLISHING INNER WALL OF HOLE FORMED AT SILICON CATHODE USING WIRES |
摘要 |
PURPOSE: An apparatus for polishing the inner wall of a hole formed at a silicon cathode using wires is provided to be capable of removing particles and micro cracks generated at the inner wall of the hole by using the abrasion between the wire and slurry. CONSTITUTION: A pair of wire fixing jigs(22a,22b) is installed and spaced apart from a silicon cathode(13) for conserving the interval between wires connected through a plurality of holes of the fixing jigs and the silicon cathode. A pair of fixing jig rings are installed at the wire fixing jigs for fixing the wires drawn from the holes of the fixing jig. A wire bolt(25a) is located at the end portion of the fixing jig ring for controlling the tensile force of the wire. A wire moving part(102) is installed for fixing the wire fixing jigs and silicon cathode, and abrading between the holes of the silicon cathode and the wires by moving the wire fixing jigs while jetting slurry at the entire surface of the silicon cathode.
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申请公布号 |
KR20030056551(A) |
申请公布日期 |
2003.07.04 |
申请号 |
KR20010086788 |
申请日期 |
2001.12.28 |
申请人 |
WIN TECH. INDUSTRIES CO., LTD. |
发明人 |
BAE, GYU HO;LEE, HYEONG WOL |
分类号 |
H01L21/304;(IPC1-7):H01L21/304 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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